Method and system for producing light manipulating pattern on a surface

A system for use in producing a pattern with a predetermined focusing property to be formed within a surface region of a certain diameter of an optical element, the system being configured as a computerized system comprising data input and output utilities, memory utility and a data processor system, the data processor system comprising:

• an analyzer configured and operable to utilize transmission property of a binary arrangement of N Fresnel zones along said patterned region of the certain diameter for a predetermined wavelength λ and a predetermined focal length f, where each n-th Fresnel zone has a central radius rn=√{square root over (nλf)}, n=1, . . . , N, and determining a period of a binary Dammann grating as √{square root over (2λf)} and position data of the number N of periods of the binary Dammann gratings such that each n-th period of the binary Dammann grating has the central radius rn=√{square root over (nλf)};
• a Dammann grating optimizer configured and operable to utilize data indicative of the period of the binary Dammann grating and said position data and determine an optimized arrangement of a selected number M of transition points, x1, . . . , xM, along a radial dimension of each period of the binary Dammann grating such that said optimized arrangement of the transition points provides said predetermined focusing property of the pattern providing one of the following:
• (i) inducing focusing functionality in the optical element providing the focal length f of the pattern with enhanced energy efficiency as compared to an energy efficiency of the binary arrangement of the N Fresnel zones;
• or (ii) providing an extended depth of focus with enhanced energy efficiency around a focal plane of an optical element with said predetermined focal length f having said patterned region;
• and
• a pattern data generator configured and operable to generate pattern data indicative of the pattern comprising the optimized arrangement of the M transition points for each of said N periods of the binary Damman gratings.