Substrate processing apparatus and substrate processing method

Abstract

A substrate processing device according to one aspect of the present disclosure processes a substrate using a processing fluid in a supercritical state, the substrate processing device comprising: a processing container that has a loading/unloading port for the substrate and internally forms a processing space in which the substrate is processed with the processing fluid; a lid body that opens and closes the loading/unloading port; an inner seal member that is provided between the processing container and the lid body in a state of surrounding the loading/unloading port; an outer seal member that is provided between the processing container and the lid body around the inner seal member in a state of surrounding the loading/unloading port; a movement mechanism that moves the lid body between an open position in which the loading/unloading port is opened and a closed position in which the outer seal member is in contact with the processing container and the lid body; a suction flow path for suctioning an atmosphere surrounded by the inner seal member and the outer seal member; a flow meter for detecting the flow rate of a fluid flowing through the suction flow path; a pressure sensor for detecting the pressure of the suction flow path; and a control circuit. The control circuit executes (a) a step for moving the lid body from the open position to the closed position, (b) a step for suctioning the atmosphere by means of the suction flow path after the step (a), (c) a step for calculating an integrated flow rate of the fluid flowing through the suction flow path during a period from the start of suction of the atmosphere until the pressure of the suction flow path becomes a threshold value or lower, and (d) a step for determining the state of the inner seal member on the basis of the integrated flow rate.

Dependencies are inferred from the claim text.