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US 2026/0307003 A1Published application
Gas processing device and gas production method
AssigneeHirata Corporation
InventorsRempei KUWAHARA, Junichi NISHIDE
Life of this patent
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Abstract
A gas processing device includes a buffer tank to which a processing target gas is supplied, a first remover that removes impurities from the processing target gas, and a circulation unit configured to circulate the processing target gas between the buffer tank and the first remover. The processing target gas having a reduced impurity concentration is discharged from the buffer tank.
Claims15
A gas processing device comprising:
- a buffer tank to which a processing target gas is supplied;
- a first remover that removes impurities from the processing target gas;
- and
- a circulation unit configured to circulate the processing target gas between the buffer tank and the first remover, wherein
- the processing target gas having a reduced impurity concentration is discharged from the buffer tank.
2 more elements
A gas production method comprising:
- a supply process of supplying a processing target gas to a buffer tank;
- a circulation process of circulating the processing target gas between the buffer tank and a first remover that removes impurities from the processing target gas;
- and
- a discharge process of discharging the processing target gas having a reduced impurity concentration from the buffer tank.
1 more element
Dependencies are inferred from the claim text.