Display Device, Electronic Device, And Method Of Fabricating The Display Device

An electronic device comprising a display device providing a display screen,

• wherein the display device comprises:
• a substrate having a display area and a non-display area;
• an insulating layer located in the display area and the non-display area;
• a connection electrode located in the display area of the substrate, the connection electrode on the insulating layer;
• a reflective electrode on the connection electrode;
• a capping layer on the reflective electrode;
• a first electrode on the capping layer;
• a pixel defining layer on the first electrode and defining an emission area exposing the first electrode;
• a light emitting stack on the first electrode and on the pixel defining layer;
• a second electrode on the light emitting stack;
• two pads located in a pad portion of the non-display area of the substrate, the insulating layer on the pads, for each pad, the insulating layer having a pad contact hole exposing the pad;
• a residual layer on the insulating layer, the residual layer comprising a conductive material, the residual layer located between the two pads;
• and
• a dummy layer located on the residual layer, the dummy layer comprising an insulating material.

A method for fabricating a display device, the method comprising:

• forming a first insulating layer on a semiconductor substrate having a display area and a non-display area;
• forming a pad connection electrode inside a via hole of the first insulating layer, the pad connection electrode located in the non-display area;
• forming a second insulating layer on the pad connection electrode;
• forming a first contact hole that exposes the pad connection electrode by penetrating the second insulating layer;
• forming a pad connected to the pad connection electrode through the first contact hole on the second insulating layer;
• forming a third insulating layer on the entire surface of the substrate including the pad and the second insulating layer;
• forming a via hole of the third insulating layer, the via hole located in the display area;
• forming a via electrode inside the via hole of the third insulating layer and simultaneously forming a residual layer on the third insulating layer in the non-display area;
• forming a pad contact hole that exposes the pad by penetrating the third insulating layer;
• forming an intermediate layer on the third insulating layer, the pad, an inner wall of the pad contact hole and the residual layer;
• forming an organic layer on the intermediate layer;
• forming a high refractive index organic layer on the organic layer;
• forming a first photoresist pattern on the high refractive index organic layer;
• etching the high refractive index organic layer and the organic layer using the first photoresist pattern as a mask to expose the intermediate layer on the pad;
• removing the first photoresist pattern;
• forming a second photoresist pattern on the intermediate layer and the high refractive index organic layer to expose the pad contact hole;
• and
• using the second photoresist pattern as a mask, removing a portion of intermediate layer over the pad, but not removing a portion of the intermediate layer over the residual layer.