Method for manufacturing image display device and image display device

An image display device comprising:

• a substrate including a first surface;
• a second part located on the first surface, the second part being light-reflective;
• a graphene-including layer located on the second part;
• a semiconductor layer located on the graphene-including layer, the semiconductor layer including:
• a bottom surface on the graphene-including layer, and
• a plurality of light-emitting surfaces at a surface at a side opposite to the bottom surface;
• a first insulating film that covers the first surface, the graphene-including layer, and a lateral surface of the semiconductor layer;
• a plurality of transistors located on the first insulating film;
• a second insulating film that covers the first insulating film and the plurality of transistors;
• a plurality of vias extending through the first and second insulating films;
• and
• a wiring layer located on the second insulating film, the wiring layer comprises wiring parts that are electrically connected to the plurality of transistors, the plurality of light-emitting surfaces, and the plurality of vias;
• wherein:
• an outer perimeter of the semiconductor layer is located within an outer perimeter of the second part in a plan view;
• the semiconductor layer comprises a first semiconductor layer, a light-emitting layer located on the first semiconductor layer, and a second semiconductor layer located on the light-emitting layer, the first semiconductor layer, the light-emitting layer, and the second semiconductor layer being stacked in this order from the bottom surface toward the light-emitting surface;
• the first semiconductor layer comprises a connection part;
• and
• the plurality of vias are located between the wiring layer and the connection part and are electrically connecting the first semiconductor layer and the wiring layer.