SCALABLE CIRCUIT-UNDER-PAD DEVICE TOPOLOGIES FOR LATERAL GaN POWER TRANSISTORS
AssigneeGaN Systems Inc.
InventorsAhmad MIZAN, Hossein MOUSAVIAN, Xiaodong CUI
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AssigneeGaN Systems Inc.
InventorsAhmad MIZAN, Hossein MOUSAVIAN, Xiaodong CUI
Estimating the term…
Circuit-Under-Pad (CUP) device topologies for high current lateral GaN power transistors comprise source, drain and gate finger electrodes on active regions of a plurality of sections of a multi-section transistor, and a contact structure comprising source and drain contact areas, e.g. drain and source pads extending over active regions of each section, interconnected by conductive micro-vias to respective underlying drain and source finger electrodes. Alternatively, source contact areas comprise parts of a source bus which runs over inactive regions. For reduced gate loop inductance, the source bus may be routed over or under the gate bus. The pad structure and the micro-via interconnections are configured to reduce current density in self-supported widths of the drain finger electrodes. Example CUP device structures provide for higher current carrying capability and reduced drain-source resistance.
A semiconductor device structure comprising a lateral GaN (gallium nitride) power transistor comprising:
Dependencies are inferred from the claim text.