Memory-only cubes and methods of forming the same
AssigneeMicron Technology, Inc.
InventorWei Zhou
Life of this patent
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AssigneeMicron Technology, Inc.
InventorWei Zhou
Estimating the term…
Memory-only cubes and methods of forming the same are disclosed herein. In one embodiment, a semiconductor device includes a stack of semiconductor dies including a first semiconductor die and a second semiconductor die bonded to the first semiconductor die. A dielectric layer can be disposed on a side of the first semiconductor die opposite the second semiconductor die and can include a plurality of interconnect structures formed therein. The semiconductor device can lack a bondline between the first semiconductor die and the dielectric layer. The dielectric layer can comprise low-temperature silicon dioxide. One or more of the plurality of interconnect structures can extend at least partway through the dielectric layer. The semiconductor device can include external contacts formed on the interconnect structures. The dielectric layer can emulate an interface die or logic die of a high-bandwidth memory device.
A semiconductor device, comprising:
A method of manufacturing a semiconductor device, the method comprising:
A system-in-package (SiP) device, comprising:
Dependencies are inferred from the claim text.