Coordinated motion metrology device

A coordinated motion bright field—dark field metrology device, comprising:

• a rotatable metrology chuck;
• a metrology stage positioned above said metrology chuck, said metrology stage translatable in an X axis via an X axis motor assembly and translatable in a Y axis via a Y axis motor assembly to perform a bright field—dark field metrology scan;
• a modulator attached to said metrology stage, said modulator having a rotatable modulator wheel rotatable about an A axis by an A axis motor assembly;
• a scan light source attached to said metrology stage, passing a scan light beam through said rotatable modulator wheel to present a structured scan light beam onto a target on said chuck;
• a dark field line scan camera and a bright field line scan camera attached to said metrology stage;
• a motion controller connected to said modulator wheel's A axis motor assembly, to said metrology stage's X axis and Y axis motor assemblies, and to a shuttering control of said dark field and bright field line scan cameras, and to said scan light source;
• and
• a main computer providing coordinated motion signals to said motion controller to synchronize the motion of said metrology stage, said modulator wheel, a shuttering of said dark field and said bright field line scan cameras, and a powering of said scan light source so as to establish a frame of reference for acquired scan images;
• a common frame of reference for each Si wafer scanned, created by said coordinated motion of said modulator wheel, said metrology stage, and said bright field—dark field camera shuttering, said common frame of reference having a positional coordinate for each scan image acquired by said bright field and dark field line scan cameras.