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US 2026/0301135 A1Published application
Apparatus and methods to generate deblurring model and deblur image
AssigneeASML Netherlands B.V.
InventorsHairong LEI, Wei FANG
Life of this patent
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AssigneeASML Netherlands B.V.
InventorsHairong LEI, Wei FANG
Estimating the term…
Described herein is a method, and system for training a deblurring model and deblurring an image (e.g., SEM image) of a patterned substrate using the deblurring model and depth data associated with multiple layers of the patterned substrate. The method includes obtaining, via a simulator using a target pattern as input, a simulated image of the substrate, the target pattern comprising a first target feature to be formed on a first layer, and a second target feature to be formed on a second layer located below the first layer; determining, based on depth data associated with multiple layers of the substrate, edge range data for features of the substrate; and adjusting, using the simulated image and the edge range data associated with the target pattern as training data, parameters of a base model to generate the deblurring model to a deblur image of a captured image.
1-20. (canceled)
A non-transitory computer-readable medium for storing instructions that are executable by one or more processors of a system to cause the system to perform operations for applying a deblurring model to deblur a captured image of a patterned substrate, the operations comprising:
A system for deblurring an image of a patterned substrate, the system comprising:
A method for deblurring a captured image of a patterned substrate, the method comprising:
Dependencies are inferred from the claim text.