Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
AssigneeKokusai Electric Corporation
InventorsTakuya JODA, Riku MINETA
Life of this patent
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Abstract
It is possible to improve characteristics of a film formed on a substrate. There is provided a technique that includes: (a) supplying a source gas; (b) supplying a first adsorption promoter; (c) supplying a reactive gas; (d) forming a film on a substrate by sequentially performing (a), (b) and (c) a predetermined number of times; and (e) supplying a first adsorption inhibitor in (d), wherein (e) is performed before (b) or after (b), or (e) is performed before (b) and after (b).
Claims19
A substrate processing method comprising:
- (a) supplying a source gas;
- (b) supplying a first adsorption promoter;
- (c) supplying a reactive gas;
- (d) forming a film on a substrate by sequentially performing (a), (b) and (c) a predetermined number of times;
- and
- (e) supplying a first adsorption inhibitor in (d),
- wherein (e) is performed before (b) or after (b), or (e) is performed before (b) and after (b).
A substrate processing apparatus comprising:
- a gas supplier configured to supply a source gas, a first adsorption promoter, a reactive gas and a first adsorption inhibitor to a substrate;
- and
- a controller configured to be capable of controlling the gas supplier to perform:
- (a) supplying the source gas;
- (b) supplying the first adsorption promoter;
- (c) supplying the reactive gas;
- (d) forming a film on the substrate by sequentially performing (a), (b) and (c) a predetermined number of times;
- and
- (e) supplying the first adsorption inhibitor in (d),
- wherein (e) is performed before (b) or after (b), or (e) is performed before (b) and after (b).
A non-transitory computer-readable recording medium storing a program that causes a substrate processing apparatus, by a computer, to perform:
- (a) supplying a source gas;
- (b) supplying a first adsorption promoter;
- (c) supplying a reactive gas;
- (d) forming a film on a substrate by sequentially performing (a), (b) and (c) a predetermined number of times;
- and
- (e) supplying a first adsorption inhibitor in (d),
- wherein (e) is performed before (b) or after (b), or (e) is performed before (b) and after (b).
Dependencies are inferred from the claim text.