Gas phase deposition reactor and method for producing polycrystalline silicon

Abstract

A process for producing polycrystalline silicon and a gas phase deposition reactor utilizing the same. The gas phase deposition reactor includes a measuring apparatus that is operably configured to determine haze within a reactor space during deposition. Where the haze determined is a measure of an amount of particles within a reaction gas atmosphere within the reaction space of the gas phase deposition reactor. Where the measuring apparatus comprises a scattered light detector and/or extinction detector having an external source of electromagnetic radiation and the gas phase deposition reactor is a Siemens reactor or a fluidized bed reactor.

Dependencies are inferred from the claim text.