Refreshing glucose sensor and measuring glucose with implantable cgm

A method for glucose measurement, the method comprising:

• providing a continuous glucose monitor (CGM) device comprising a nanoporous layer and configured to generate an electrical signal indicative of glucose oxidation occurring in the nanoporous layer while the nanoporous layer is in contact with liquid containing glucose, wherein the nanoporous layer comprises metal nanoparticles;
• causing to insert at least part of the CGM device into a subject's body such that the nanoporous layer is in contact with interstitial fluid of the subject, wherein sensitivity of the nanoporous layer for glucose oxidation deteriorates over time while the CGM device is maintained in the subject's body;
• maintaining the at least part of the CGM device in the subject's body over time during which materials from the interstitial fluid cover some surfaces of the metal nanoparticles that would otherwise be available for glucose oxidation, rendering the covered surfaces incapable of interacting with glucose for glucose oxidation;
• while the CGM device is maintained in the subject's body, applying a cleaning voltage input to the nanoporous layer to cause removal of at least part of the materials covering surfaces of the metal nanoparticles therefrom;
• and
• after applying the cleaning voltage input while the CGM device is maintained in the subject's body, applying a glucose oxidation voltage input to the nanoporous layer to cause glucose oxidation therein and measuring the electrical signal indicative of glucose oxidation therein for determining a glucose level for the subject,
• wherein the electrical signal indicative of glucose oxidation has a correlation with an effective surface area of the metal nanoparticles in the nanoporous layer such that, at a given glucose concentration in the liquid, the larger the effective surface area is, the greater the electrical signal indicative of glucose oxidation is generated,
• wherein the glucose oxidation voltage input is a DC voltage, whereas the cleaning voltage input comprises a non-DC voltage waveform that causes to form an oxide layer on surfaces of at least part of the metal nanoparticles such that the oxide layer is interposed between the at least part of the metal nanoparticles and at least part of the materials, wherein the non-DC voltage waveform further causes to dissolve the oxide layer such that the at least part of the materials releases from at least part of the metal nanoparticles.