Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a rotary holder configured to hold and rotate a substrate;
• a processing liquid supply configured to supply a processing liquid to the substrate that is rotating while being held by the rotary holder;
• a heater configured to irradiate light onto the substrate held by the rotary holder, thereby heating the substrate;
• a cover body including an opposing surface that faces the substrate held by the rotary holder, provided between the substrate held by the rotary holder and the heater, and transmitting the light irradiated by the heater;
• and
• a controller configured to control the rotary holder, the processing liquid supply, and the heater,
• wherein the controller is configured to:
• supply the processing liquid to the substrate that is rotating by the rotary holder, thereby processing the substrate, and
• perform a first drying process that irradiates the light onto the substrate held by the rotary holder to heat the substrate, thereby drying the opposing surface of the cover body.