Display device, method of manufacturing the same and electronic device including the same

A method of manufacturing a display device, comprising:

• forming pixel electrodes on the base substrate;
• sequentially forming a first insulating layer, a second insulating layer, and a third insulating layer covering the pixel electrodes;
• etching the third insulating layer and the second insulating layer to form a third insulating pattern and a second insulating pattern;
• etching a side surface of the second insulating pattern by a wet etching while suppressing an etched thickness of the first insulating layer to 5 nm or less to form a groove;
• etching the first insulating layer to form a first insulating pattern;
• forming a light-emitting portion on the pixel electrodes;
• and
• forming a counter electrode on the light-emitting portion.

An electronic device, comprising:

• a display device;
• a memory;
• and
• one or more processors executing data included in the memory to control an operation of the display device,
• wherein the display device comprises:
• a base substrate;
• transistor structures arranged on the base substrate;
• pixel electrodes electrically connected to each of the transistor structures on the base substrate;
• a pixel defining layer comprising:
• a lower stack filling a space between the pixel electrodes and covering a peripheral portion of the pixel electrodes;
• and
• an upper stack comprising a first insulating pattern, a second insulating pattern, and a third insulating pattern sequentially stacked on the lower stack;
• and
• a light-emitting portion on the pixel defining layer and the pixel electrodes;
• and
• a counter electrode on the light-emitting portion,
• wherein a width of the second insulating pattern is smaller than a width of the first insulating pattern and a width of the third insulating pattern, and a difference between a maximum thickness and a minimum thickness of the first insulating pattern is 5 nm or less.