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US 2026/0293313 A1Published application
Semiconductor device, display device, and method for manufacturing semiconductor device
AssigneeSharp Display Technology Corporation
InventorsShinji NAKAJIMA, Kazuhiko IWASA, Masamitsu YAMANAKA, Yutaka SAWAYAMA, Yoshimasa CHIKAMA
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Abstract
A semiconductor device comprises a semiconductor portion formed from a part of a semiconductor film; and a first insulating film disposed in a higher layer than the semiconductor film and containing at least silicon and oxygen, wherein the first insulating film includes a first layer, and a second layer positioned in a higher layer than the first layer and having a lower content of the oxygen than the first layer.
Claims12
A semiconductor device comprising:
- a semiconductor portion formed from a part of a semiconductor film;
- and
- a first insulating film disposed in a higher layer than the semiconductor film and containing at least silicon and oxygen,
- wherein the first insulating film includes
- a first layer, and
- a second layer positioned in a higher layer than the first layer and having a lower content of the oxygen than the first layer.
3 more elements
A method for manufacturing a semiconductor device, comprising:
- providing a semiconductor portion by forming a semiconductor film, followed by patterning the semiconductor film as formed;
- and
- providing, in a higher layer than the semiconductor film, a first insulating film containing at least silicon and oxygen,
- wherein the providing of the first insulating film comprises forming a first layer, followed by forming, in a higher layer than the first layer, a second layer having a lower content of the oxygen than the first layer.
1 more element
Dependencies are inferred from the claim text.