Treatment of electrodes of mim capacitors

A structure comprising:

• a plurality of conductive electrodes comprising titanium nitride, wherein upper ones of the plurality of conductive electrodes overlap respective lower ones of the plurality of conductive electrodes;
• a plurality of capacitor insulators between and separating neighboring ones of the plurality of capacitor insulators, with one of the plurality of capacitor insulators comprising:
• a first metal oxide layer;
• a high-k dielectric layer over the first metal oxide layer;
• a dielectric layer over the high-k dielectric layer;
• and
• a second metal oxide layer over the dielectric layer;
• a first contact plug electrically connecting to first electrodes of the plurality of conductive electrodes;
• and
• a second contact plug electrically connecting to second electrodes of the plurality of conductive electrodes.

A structure comprising:

• a first electrode comprising a metal;
• a first dielectric layer over the first electrode, wherein the first dielectric layer comprises a metal oxynitride, and wherein the metal oxynitride comprises a same metal as the first electrode;
• a second dielectric layer over the first dielectric layer, wherein the second dielectric layer has a first dielectric constant and a first thickness;
• a dielectric capping layer over the second dielectric layer, wherein the dielectric capping layer has a second dielectric constant higher than the first dielectric constant;
• a second electrode over the dielectric capping layer;
• a first contact plug electrically connecting to the first electrode;
• and
• a second contact plug electrically connecting to the second electrode.