Electrostatic chuck device
AssigneeSumitomo Osaka Cement Co., Ltd.
InventorsYuki KINPARA, Taku ICHIYOSHI, Satoyoshi INUI, Toru SUGAMATA
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AssigneeSumitomo Osaka Cement Co., Ltd.
InventorsYuki KINPARA, Taku ICHIYOSHI, Satoyoshi INUI, Toru SUGAMATA
Estimating the term…
An electrostatic chuck device includes: a plate-shaped electrostatic chucking portion and a base portion that has a disk shape around a central axis and that supports the electrostatic chucking portion on a support surface of the base portion. A refrigerant channel that extends along the support surface is provided inside the base portion. The refrigerant channel has a first channel portion that is formed around at least one through-hole penetrating the base portion in an axial direction of the central axis at an interval from the through-hole on an outer side in a hole diameter direction of the through-hole, and a second channel portion that is located on both sides of the first channel portion in an extension direction of the refrigerant channel. A channel cross-sectional area of the first channel portion is smaller than a channel cross-sectional area of the second channel portion.
An electrostatic chuck device comprising:
Dependencies are inferred from the claim text.