Substrate processing apparatus and substrate processing method

A substrate processing method in a substrate processing apparatus including:

• a first processing chamber configured to store a first processing unit that performs first processing on a substrate;
• a second processing chamber configured to store a second processing unit that performs second processing on a substrate;
• and an intake and exhaust pipe configured to suck and exhaust gas from the first processing chamber and the second processing chamber, the substrate processing method comprising:
• a first exhaust process of making an exhaust flow rate of the first processing chamber larger than an exhaust flow rate of the second processing chamber when substrate processing is executed in the first processing chamber;
• and
• a second exhaust process of making an exhaust flow rate of the second processing chamber larger than an exhaust flow rate of the first processing chamber when substrate processing is executed in the second processing chamber.