Atomic layer deposition device
AssigneeHanwha Solutions Corporation
InventorsByung Ju KANG, No Won KWAK, Hyun Woo KIM, Kwang Hyun CHOI, Jeong Ho SEO
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Abstract
An atomic layer deposition device according to an embodiment of the present invention includes: a chamber that accommodates a plurality of wafers; a plurality of heaters disposed on a surface of the chamber; and a control unit that controls the heaters, wherein the chamber is divided into a plurality of zones in a first direction defined as an extension direction of the chamber, the plurality of heaters are disposed in each of the plurality of zones of the chamber, and the control unit controls temperatures of the plurality of heaters separately.
Claims9
An atomic layer deposition device comprising:
- a chamber that accommodates a plurality of wafers;
- a plurality of heaters disposed on a surface of the chamber;
- and
- a control unit that controls the heaters,
- wherein the chamber is divided into a plurality of zones in a first direction defined as an extension direction of the chamber,
- the plurality of heaters are disposed in each of the plurality of zones of the chamber, and
- the control unit controls temperatures of the plurality of heaters separately.
Dependencies are inferred from the claim text.