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US 2026/0286201 A1Published application
System and a method for cationization of abrasive particles
AssigneeFujimi Incorporated
InventorJimmy Granstrom
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Abstract
To provide systems and methods for cationization of abrasive particles. Systems and methods are provided for a polishing composition comprising polishing abrasive particles, and a water soluble metal salt, wherein the metal cation of the water soluble metal salt is hydrolyzed at a pH greater than or equal to seven without forming a precipitate.
Claims14
A polishing composition, comprising:
- polishing abrasive particles, and
- a water soluble metal salt,
- wherein a metal cation of the water soluble metal salt is hydrolyzed at a pH≥7 without forming a precipitate, and/or the polishing abrasive particle has a zeta potential >0 at a pH≥7.
Dependencies are inferred from the claim text.