Back to results
US 2026/0286171 A1Published application
Method
AssigneeSumitomo Chemical Company, Limited
InventorsHelen Benjamin, Senthil Kabali, Martin Humphries
Life of this patent
Estimating the term…
Abstract
A method of forming a self-assembled film on a surface of a substrate (101). A solution comprising a block copolymer and a solvent is deposited onto the surface. The block copolymer is a rod-coil copolymer comprising a rod block A and a coil block B. The surface may carry one or more features (103) for directing self-assembly of the rod-coil polymer.
Claims19
-16. (canceled)
A method of patterning a substrate comprising providing a directed self-assembled rod-coil block copolymer comprising a rod block A and a coil block B over a surface of the substrate;
- selectively removing one of the rod block A and the coil block B;
- and patterning the substrate.
Dependencies are inferred from the claim text.