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US 2026/0285746 A1Published application
Process to make frequency selective surface
AssigneeAgc Glass Europe
InventorsHéloïse ROELANDTS, Laura Ouidade OUANAIM
Life of this patent
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Abstract
A method for making a micro-scale masking pattern on a substrate through deposition of a shear thinning lacquer where the micro-scale masking pattern includes lines having a width of at least 30 μm and a width deviation of the lines being at most 35%.
Claims20
A method for making a micro-scale masking pattern on a substrate, comprising:
- depositing a shear thinning lacquer,
- wherein the micro-scale masking pattern comprises lines having a width of at least 30 μm and a width deviation of the lines being at most 35%.
Dependencies are inferred from the claim text.