Imprint method, imprint apparatus, and article manufacturing method

An imprint method of performing imprint processing for each shot region of a substrate by using a mold, the method comprising:

• determining whether a shot region to be subjected to the imprint processing next is a first type shot region enabling use of a predetermined number of alignment marks or a second type shot region disabling use of the predetermined number of alignment marks;
• performing a first imprint process of measuring a first alignment error, concerning a first shot region determined as the first type shot region in the determining, between the first shot region and a pattern region of the mold by using the predetermined number of alignment marks and performing the imprint processing based on the first alignment error;
• and
• performing a second imprint process of performing the imprint processing for a second shot region determined as the second type shot region in the determining based on a result of measuring a second alignment error between the second shot region and the pattern region by using usable alignment marks and the first alignment error obtained in at least the latest first imprint process.

An imprint apparatus that performs imprint processing by using a mold for each shot region of a substrate having a plurality of shot regions that can be classified into a first type shot region enabling use of a predetermined number of alignment marks and a second type shot region disabling use of the predetermined number of alignment marks, the apparatus comprising:

• a controller configured to control the imprint processing;
• and
• an alignment scope configured to measure an alignment error between a selected shot region of the substrate and a pattern region of the mold,
• wherein the controller controls a sequence of the imprint processing for the plurality of shot regions so as to alternately execute the imprint processing for at least one of the first type shot region and the imprint processing for at least one of the second type shot region,
• controls a first imprint process of measuring a first alignment error, with respect to a first shot region classified as the first type shot region, between the first shot region and the pattern region by using the predetermined number of alignment marks by using the alignment scope and performing the imprint processing based on the first alignment error, and
• controls a second imprint process of performing the imprint processing for a second shot region classified as the second type shot region based on a result of measuring a second alignment error between the second shot region and the pattern region by using usable alignment marks with the alignment scope and the first alignment error obtained in at least the latest first imprint process.

An imprint apparatus that performs imprint processing for each shot region of a substrate by using a mold, the apparatus comprising:

• a controller configured to control the imprint processing;
• and
• an alignment scope configured to measure an alignment error between a selected shot region of the substrate and a pattern region of the mold,
• wherein the controller determines whether a shot region to be subjected to the imprint processing next is a first type shot region enabling use of a predetermined number of alignment marks or a second type shot region disabling use of the predetermined number of alignment marks;
• controls a first imprint process of measuring a first alignment error, concerning a first shot region determined as the first type shot region, between the first shot region and the pattern region by using the predetermined number of alignment marks with the alignment scope and performing the imprint processing based on the first alignment error, and
• controls a second imprint process of performing the imprint processing for a second shot region determined as the second type shot region based on a result of measuring a second alignment error between the second shot region and the pattern region by using usable alignment marks with the alignment scope and the first alignment error obtained in at least the latest first imprint process.