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US 2026/0284829 A1Published application
Polishing pad, polishing tool, polishing apparatus, and polishing method
AssigneeCanon Kabushiki Kaisha
InventorKENSUKE SATAKE
Life of this patent
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Abstract
A polishing pad includes a base member including a first main surface and a second main surface opposite to the first main surface. The base member is plate-shaped and deformable. A polishing surface is disposed on the first main surface. A plurality of lines is disposed in the base member along the first main surface.
Claims20
A polishing pad comprising:
- a base member including a first main surface and a second main surface opposite to the first main surface, the base member being plate-shaped and deformable, a polishing surface being disposed on the first main surface,
- wherein a plurality of lines is disposed in the base member along the first main surface.
Dependencies are inferred from the claim text.