Cleaning method for substrate accommodation container and cleaning apparatus for substrate accommodation container

A cleaning apparatus for a substrate accommodation container, comprising:

• a tank capable of storing an organic amine therein;
• a holding table capable of holding a substrate accommodation container accommodating a semiconductor substrate;
• a first supplier connected to the tank, having a first supply port, and configured to be capable of supplying the organic amine to a surface of the substrate accommodation container from the first supply port;
• a second supplier having a second supply port and configured to be capable of supplying a cleaning water from the second supply port to the surface of the substrate accommodation container;
• a draining section configured to remove water drops from the surface of the substrate accommodation container;
• and
• a drier configured to dry the surface of the substrate accommodation container.