Substrate processing apparatus and substrate processing method

A substrate processing method comprising:

• loading a substrate by placing the substrate on a substrate supporter in a treatment space within a housing;
• preheating the substrate by ejecting a heat transfer medium having a first temperature to the substrate while the substrate is stationary;
• and
• subsequent to the preheating, and while rotating the substrate supporter to rotate the substrate, supplying a liquid chemical having a second temperature lower than the first temperature toward an upper surface of the substrate supported by the substrate supporter, the liquid chemical being a polymer-based cleaning solution for performing a cleaning process on the substrate.

A substrate processing method using a substrate processing apparatus comprising a housing for forming a treatment space where a substrate is processed, a substrate supporter mounted in the treatment space to rotate about a rotational axis, and provided to support the substrate, a liquid chemical supplier provided above the substrate supporter to supply a liquid chemical toward an upper surface of the substrate supported by the substrate supporter, and an ejector provided to eject a heat transfer medium having a temperature relatively higher than the temperature of the liquid chemical onto the substrate,

• the substrate processing method comprising:
• loading the substrate into the treatment space of the housing and placing the substrate on the substrate supporter;
• ejecting the heat transfer medium having the temperature higher than the temperature of the liquid chemical onto the substrate to preheat the substrate;
• and
• after the ejecting of the heat transfer medium has stopped, beginning to supply the liquid chemical toward the upper surface of the preheated substrate, the liquid chemical including a polymer-based cleaning solution.

A substrate processing method comprising:

• loading a substrate by placing the substrate on a substrate supporter in a treatment space within a housing;
• preheating the substrate by ejecting a heat transfer medium having a first temperature to the substrate;
• subsequent to the preheating, and while the substrate is at the preheated temperature, rotating the substrate, supplying a liquid chemical having a second temperature lower than the first temperature toward an upper surface of the substrate supported by the substrate supporter, the liquid chemical being a cleaning solution for performing a cleaning process on the substrate;
• and
• subsequent to supplying the liquid chemical, sequentially performing a rinsing and a drying process on the substrate.