Apparatus, system and method for processing exhaust gas

A system for processing an exhaust gas, comprising:

• a reaction chamber, having an absorption area, a desorption area and a reactivation area;
• a carrier, disposed in the reaction chamber and having a plurality of through holes, wherein the carrier moves in the absorption area, the desorption area and the reactivation area in sequence repeatedly;
• and
• catalysts, distributed on the carrier,
• wherein the exhaust gas enters the reaction chamber, passes through the absorption area and the desorption area, and leaves the reaction chamber.

A method for processing an exhaust gas, comprising:

• providing an apparatus/a system, wherein the apparatus/the system comprises:
• a rotary plate, disposed in reaction chamber and having a plurality of through holes penetrating through the rotary plate, wherein the rotary plate is configured to rotate in a first direction around a central axis of the reaction chamber;
• a first separation plate, a second separation plate and a third separation plate, disposed in the reaction chamber and disposed uprightly on the rotary plate, wherein the first and second separation plates define and segregate a first division in the reaction chamber and a first division area on the rotary plate, the second and third separation plates define and segregate a second division in the reaction chamber and a second division area on the rotary plate, and the first and third separation plates define and segregate a third division in the reaction chamber and a third division area on the rotary plate, the connecting pipe connects the first division and the second division, the first division area is an adsorption/reaction area, the second division area is a desorption area, the third division area is a reactivation area;
• catalysts, distributed on the rotary plate over the first, second and third division areas and beside and between the plurality of through holes;
• a heater, disposed inside the second division of the reaction chamber and located above the second division area;
• a plurality of sprayers, disposed in the third division of the reaction chamber and located above the third division area;
• and
• a fluid tank, containing a fluid comprising a regenerating agent and for supplying the regenerating agent into the third division of the reaction chamber over the catalysts in the third division area;
• performing a microfabrication process to a semiconductor structure in a microfabrication tool and generating an exhaust gas;
• operating the apparatus/the system upon receiving the exhaust gas expelled from the microfabrication tool into the apparatus/the system;
• treating the exhaust gas using the catalysts in the apparatus/the system;
• and
• discharging treated exhaust gas from the apparatus/system.