Substrate processing device
AssigneeSCREEN Holdings Co., Ltd.
InventorsShotaro TSUDA, Takayuki NISHIDA
Life of this patent
Estimating the term…
Abstract
A substrate processing device includes a plurality of cleaning members arranged in parallel in a radial direction of a substrate and cleaning the substrate; a support member supporting the plurality of cleaning members; a rotary drive part causing the support member to relatively rotate with respect to the substrate; a plurality of connecting members connecting each of the plurality of cleaning members and the support member and each being capable of moving up and down independently; and a pressing force adjustment mechanism causing the plurality of connecting members to move up and down respectively such that each of pressing forces exerted on the substrate by each of the plurality of cleaning members becomes uniform.
Claims9
A substrate processing device, comprising
- a plurality of cleaning members arranged in parallel in a radial direction of a substrate and cleaning the substrate;
- a support member supporting the plurality of cleaning members;
- a rotary drive part causing the support member to relatively rotate with respect to the substrate;
- a plurality of connecting members connecting each of the plurality of cleaning members and the support member and each being capable of moving up and down independently;
- and
- a pressing force adjustment mechanism causing the plurality of connecting members to move up and down respectively such that each of pressing forces exerted on the substrate by each of the plurality of cleaning members becomes uniform.
Dependencies are inferred from the claim text.