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US 2026/0283283 A1Published application
Measuring position of graphics on garment pattern
AssigneeClo Virtual Fashion Inc.
InventorsPhoebe GATTA, Ho Hyun LEE, Wonseop LEE
Life of this patent
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Abstract
Disclosed are an apparatus and a method of measuring a position of a graphic disposed on a garment pattern. According to an embodiment, the method includes determining a measure point in a first-type entity included in a garment pattern, determining a measure point in a second-type entity included in the garment pattern, wherein the measure point intersects a line segment parallel to a predetermined axis passing through the measure point in the first-type entity, and outputting a measurement distance between the measure point in the first-type entity and the measure point in the second-type entity.
Claims20
A method of measuring a position of a graphic disposed on a garment pattern, the method comprising:
- determining a first measure point in a first-type entity included in a garment pattern;
- determining a second measure point in a second-type entity included in the garment pattern, wherein the second measure point intersects a line segment parallel to a predetermined axis passing through the first measure point in the first-type entity;
- outputting a measurement distance between the first measure point in the first-type entity and the second measure point in the second-type entity;
- determining the first measure point in the first-type entity or the second measure point in the second-type entity as a fixed measure point;
- updating a dynamic measure point in an entity of a different type from the first-type entity or the second-type entity associated with the fixed measure point, wherein the dynamic measure point intersects a line segment parallel to a predetermined axis passing through the fixed measure point after at least one of a position and a size of a graphic region in the garment pattern is changed;
- and
- obtaining an updated measurement distance between the first measure point in the first-type entity and the second measure point in the second-type entity,
- wherein, when the first-type entity is a graphic region, the second-type entity comprises an outline of the garment pattern, and
- wherein, when the first-type entity is the outline of the garment pattern, the second-type entity comprises the graphic region.
6 more elements
A method of measuring a position of a graphic disposed on a garment pattern, the method comprising:
- determining a first measure point in a first-type entity included in a garment pattern;
- determining a second measure point in a second-type entity included in the garment pattern, wherein the second measure point intersects a line segment parallel to a predetermined axis passing through the first measure point in the first-type entity;
- outputting a measurement distance between the first measure point in the first-type entity and the second measure point in the second-type entity;
- determining, based on the measurement distance, whether a position of a graphic region in the garment pattern is specified;
- and
- outputting a result of the determining,
- wherein, when the first-type entity is a graphic region, the second-type entity comprises an outline of the garment pattern, and
- wherein, when the first-type entity is the outline of the garment pattern, the second-type entity comprises the graphic region.
5 more elements
An electronic apparatus comprising:
- one or more processors;
- and
- a memory storing instructions thereon, the instructions, when executed by the one or more processors, cause the one or more processors to:
- determine a first measure point in a first-type entity included in a garment pattern;
- determine a second measure point in a second-type entity included in the garment pattern, wherein the second measure point intersects a line segment parallel to a predetermined axis passing through the first measure point in the first-type entity;
- output a measurement distance between the first measure point in the first-type entity and the second measure point in the second-type entity;
- determine the first measure point in the first-type entity or the second measure point in the second-type entity as a fixed measure point;
- update a dynamic measure point in an entity of a different type from the first-type entity or the second-type entity associated with the fixed measure point belongs, wherein the dynamic measure point intersects a line segment parallel to a predetermined axis passing through the fixed measure point after at least one of a position and a size of a graphic region in the garment pattern is changed;
- and
- obtain an updated measurement distance between the first measure point in the first-type entity and the second measure point in the second-type entity,
- wherein, when the first-type entity is a graphic region, the second-type entity comprises an outline of the garment pattern, and
- wherein, when the first-type entity is the outline of the garment pattern, the second-type entity comprises the graphic region.
9 more elements
An electronic apparatus comprising:
- one or more processors;
- and
- a memory storing instructions thereon, the instructions, when executed by the one or more processors, cause the one or more processors to:
- determine a first measure point in a first-type entity included in a garment pattern;
- determine a second measure point in a second-type entity included in the garment pattern, wherein the second measure point intersects a line segment parallel to a predetermined axis passing through the first measure point in the first-type entity;
- output a measurement distance between the first measure point in the first-type entity and the second measure point in the second-type entity;
- determine, based on the measurement distance, whether a position of a graphic region in the garment pattern is specified;
- and
- output a result of the determining,
- wherein, when the first-type entity is a graphic region, the second-type entity comprises an outline of the garment pattern, and
- wherein, when the first-type entity is the outline of the garment pattern, the second-type entity comprises the graphic region.
8 more elements
Dependencies are inferred from the claim text.