Methods, apparatuses, and systems for providing personal protective equipment
AssigneeHoneywell Safety Products USA, Inc.
InventorsRui LUO, Jing XU, Xiaobai RUAN, Menglong GAO, Hongbing XIANG, Yiwei ZHANG, Peng XIANG, Yuyan WANG, Bingzhong XIA
Life of this patent
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Abstract
Methods, apparatuses, and systems associated with personal protective equipment are provided. An example mask may include an exterior layer, one or more mask straps coupled to the exterior layer, and a filter layer. An example method for manufacturing a protective garment may include providing a front segment, providing a back segment, and connecting the front segment and the back segment by at least forming a front raglan seam.
Claims20
A nonwoven fiber material for mask, comprising:
- a core comprising base material without antimicrobial treatment;
- and
- a sheath surrounding the core, wherein the sheath comprises grafted PHMG.
A method for manufacturing a protective garment, comprising:
- providing a front segment, wherein the front segment comprises a first raglan edge;
- providing a back segment, wherein the back segment comprises a second raglan edge;
- and
- connecting the front segment and the back segment by at least forming a front raglan seam joining the first raglan edge and the second raglan edge.
A method for manufacturing a protective garment, comprising:
- providing a front segment, wherein the front segment comprises a first side edge;
- providing a back segment, wherein the back segment comprises a second side edge;
- connecting the front segment and the back segment by at least forming a first side seam joining the first side edge and the second side edge;
- and
- forming a first shirring stitch seam based on the first side seam, wherein the first shirring stitch seam is shorter than the first side seam.
Dependencies are inferred from the claim text.