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US 2026/0282844 A1Published application
Feed-forward device fabrication
AssigneeGoogle Inc.
InventorBrian James Burkett
Life of this patent
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Abstract
A method includes: forming an opening in a mask layer; measuring a feature size associated with a dimension of the opening; based on the feature size, determining a fabrication parameter; and forming a second layer in the opening. Forming the second layer is based on the fabrication parameter. A fabrication system includes a lithography system; a measurement system; a physical vapor deposition system; an oxidation system; and a control system. The control system is configured to control a feed-forward fabrication process.
Claims4
A fabrication system comprising:
- a lithography system;
- a measurement system;
- a physical vapor deposition system;
- an oxidation system;
- and
- a control system, wherein the control system is configured to perform operations comprising:
- causing the lithography system to form an opening in a mask layer;
- causing the measurement system to measure a feature size associated with a dimension of the opening;
- based on the feature size, determining an oxide growth parameter;
- causing the physical vapor deposition system to deposit a first metal layer in the opening;
- causing the oxidation system to oxidize a portion of the first metal layer based on the oxide growth parameter, to form an oxide layer on the first metal layer;
- and
- causing the physical vapor deposition system to deposit a second metal layer on the oxide layer.
10 more elements
Dependencies are inferred from the claim text.