US 2026/0282824 A1 · SYSTEM AND METHOD FOR CONTACTLESS HANDLING OF SEMICONDUCTOR WAFERS

Abstract

The present disclosure generally relates to a system (100) and method (400) for contactless handling of a semiconductor wafer (200). The system (100) comprises: a wafer table (300) for supporting the semiconductor wafer (200) without physical contact between them, the wafer table (300) comprising fluidic outlets for discharging gas; pneumatic lines (140) for communicating gas to the fluidic outlets; and a pneumatic controller (150) for controlling gas communication in the pneumatic lines (140) to thereby selectively discharge gas from the fluidic outlets. A first set of the fluidic outlets discharges gas therefrom such that the discharged gas contactlessly supports the semiconductor wafer (200) relative to the wafer table (300). A second set of the fluidic outlets discharge gas therefrom such that the discharged gas rotates the semiconductor wafer (200) while the semiconductor wafer (200) is being contactlessly supported by the wafer table (300). The pneumatic controller (150) controls gas discharge from the first and second sets of fluidic outlets to thereby control support and rotation of the semiconductor wafer (200).

Claims28

Dependent claims

A system for contactless handling of a semiconductor wafer, the system comprising:

a wafer table configured for supporting the semiconductor wafer without physical contact between them, the wafer table comprising a plurality of fluidic outlets configured for discharging gas;
a plurality of pneumatic lines fluidically connected to the fluidic outlets for communicating gas to the fluidic outlets;
and
a pneumatic controller configured for controlling gas communication in the pneumatic lines to thereby selectively discharge gas from the fluidic outlets,
wherein a first set of the fluidic outlets is configured to discharge gas communicating from the pneumatic lines, such that the discharged gas from the first set of fluidic outlets supports the semiconductor wafer relative to the wafer table without physical contact between them;
wherein a second set of the fluidic outlets is configured to discharge gas communicating from the pneumatic lines, such that the discharged gas from the second set of fluidic outlets rotates the semiconductor wafer while the semiconductor wafer is being supported by the wafer table without physical contact between them;
and
wherein the pneumatic controller is configured for controlling gas discharge from the first and second sets of fluidic outlets to thereby control support and rotation of the semiconductor wafer.

5 more elements

A method for contactless handling of a semiconductor wafer, the method comprising:

positioning a semiconductor wafer and a wafer table relative to each other, the wafer table comprising a plurality of fluidic outlets configured for discharging gas;
controlling, using a pneumatic controller, gas communication in a plurality of pneumatic lines fluidically connected to the fluidic outlets to thereby selectively discharge gas from the fluidic outlets;
discharging, from a first set of the fluidic outlets, gas communicating from the pneumatic lines, such that the discharged gas from the first set of fluidic outlets supports the semiconductor wafer relative to the wafer table without physical contact between them;
discharging, from a second set of the fluidic outlets, gas communicating from the pneumatic lines, such that the discharged gas from the second set of fluidic outlets rotates the semiconductor wafer while the semiconductor wafer is being supported by the wafer table without physical contact between them;
controlling, using the pneumatic controller, gas discharge from the first and second sets of fluidic outlets to thereby control support and rotation of the semiconductor wafer.

2 more elements

Dependencies are inferred from the claim text.

System and method for contactless handling of semiconductor wafers

Life of this patent

System and method for contactless handling of semiconductor wafers

Life of this patent

Abstract

Claims28