Handling panel substrates

A semiconductor processing device, comprising:

• a processing chamber comprising one or more of:
• a rotating base for receiving a panel substrate, wherein the rotating base is capable of adjusting a rotational orientation of the panel substrate disposed thereon about a first axis;
• and
• a set of sensors that are configured detect at least a portion of the panel substrate and at least one edge of the panel substrate when the panel substrate is disposed over the rotating base;
• a transportation mechanism capable of transporting the panel substrate in at least one direction that is perpendicular to the first axis;
• and
• a computing device capable of receiving sensor data from the set of sensors and computing, based on the sensor data, a rotational correction to adjust the rotational orientation of the panel substrate to be performed by the rotating base or a translational correction to adjust a translational position of the panel substrate to be performed by the transportation mechanism.