Substrate processing apparatus, processing liquid supply device, substrate processing method and processing liquid supply method

A processing liquid supply device that supplies a processing liquid to a chamber in which a process is executed on a substrate using the processing liquid, comprising:

• a tank that is provided below the chamber and stores the processing liquid;
• a circulation flow path that causes the processing liquid in the tank to circulate between inside of the tank and outside of the tank;
• a temperature adjuster that adjusts, to a predetermined target temperature, a temperature of the processing liquid that is made to circulate by the circulation flow path;
• a chamber supply flow path that connects the circulation flow path to the chamber and guides the processing liquid flowing through the circulation flow path to the chamber;
• a chamber collection flow path that connects the tank to the chamber and returns the processing liquid used in the chamber to the tank;
• a branch flow path that connects the circulation flow path to the chamber collection flow path and guides the processing liquid flowing through the circulation flow path to the chamber collection flow path;
• and
• a flow-rate adjuster that is provided in the branch flow path and adjusts a flow rate of the processing liquid flowing through the branch flow path.

A substrate processing method of processing a substrate using a substrate processing apparatus,

• the substrate processing apparatus further comprising:
• a chamber that executes a process on the substrate using a processing liquid;
• a tank that is provided below the chamber and stores the processing liquid;
• a circulation flow path that causes the processing liquid in the tank to circulate between inside of the tank and outside of the tank;
• a chamber supply flow path that connects the circulation flow path to the chamber and guides the processing liquid flowing through the circulation flow path to the chamber;
• and
• a chamber collection flow path that connects the tank to the chamber and returns the processing liquid used in the chamber to the tank,
• the substrate processing method including:
• adjusting, to a predetermined target temperature, a temperature of the processing liquid that is made to circulate by the circulation flow path;
• guiding the processing liquid flowing through the circulation flow path to the chamber collection flow path using a branch flow path, the branch flow path connecting the circulation flow path to the chamber collection flow path;
• and
• adjusting a flow rate of the processing liquid flowing through the branch flow path.

A processing liquid supply method of supplying a processing liquid to a chamber in which a process is executed on a substrate using a processing liquid supply device,

• the processing liquid supply device comprising:
• a tank that is provided below the chamber and stores the processing liquid;
• a circulation flow path that causes the processing liquid in the tank to circulate between inside of the tank and outside of the tank;
• a chamber supply flow path that connects the circulation flow path to the chamber and guides the processing liquid flowing through the circulation flow path to the chamber;
• and
• a chamber collection flow path that connects the tank to the chamber and returns the processing liquid used in the chamber to the tank,
• the processing liquid supply method including:
• adjusting, to a predetermined target temperature, a temperature of the processing liquid that is made to circulate by the circulation flow path;
• guiding the processing liquid flowing through the circulation flow path to the chamber collection flow path using a branch flow path, the branch flow path connecting the circulation flow path to the chamber collection flow path;
• and
• adjusting a flow rate of the processing liquid flowing through the branch flow path.