US 2026/0282791 A1 · SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Abstract

The present invention relates to a substrate processing method and a substrate processing apparatus. The substrate processing method includes a treating step, a replacing step, and a pressure restoration step. In the treating step, a treating gas is supplied to a treatment space. The treatment space accommodates a substrate. In the replacing step, a pressure in the treatment space is kept lower than atmospheric pressure. In the replacing step, an inert gas is supplied to the treatment space. In the replacing step, a gaseous body is exhausted from the treatment space. In the pressure restoration step, the pressure in the treatment space returns to the atmospheric pressure. A flow rate of the inert gas supplied to the treatment space is a supply flow rate. A flow rate of the gaseous body exhausted from the treatment space is an exhaust flow rate. In the replacing step, at least either the supply flow rate or the exhaust flow rate changes with time.

Claims20

Dependent claims

A substrate processing method comprising:

a treating step of supplying a treating gas to a treatment space accommodating a substrate;
a replacing step of supplying an inert gas to the treatment space and exhausting a gaseous body from the treatment space in a state where a pressure in the treatment space is kept lower than atmospheric pressure;
and
a pressure restoration step of restoring the pressure in the treatment space to the atmospheric pressure, wherein
a flow rate of the inert gas supplied to the treatment space is defined as a supply flow rate,
a flow rate of the gaseous body exhausted from the treatment space is defined as an exhaust flow rate, and
in the replacing step, at least either the supply flow rate or the exhaust flow rate changes with time.

4 more elements

Dependencies are inferred from the claim text.

Substrate processing method and substrate processing apparatus

Life of this patent

Substrate processing method and substrate processing apparatus

Life of this patent

Abstract

Claims20