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US 2026/0282644 A1Published application
Composition and method for manufacturing light-emitting element using same
AssigneeSharp Display Technology Corporation
InventorsTakahiro ADACHI, Sentaro KIDA, YASUSHI ASAOKA
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Abstract
There is provided a photoresist capable of forming a photoresist layer having both developability and polar solvent resistance while having high peeling and removing properties as a positive-working photoresist layer. A composition constituting the photoresist includes a water-soluble resin, a positive-working photosensitizer, and a solvent, and the water-soluble resin includes a copolymer containing a vinyl alcohol monomer unit.
Claims17
A composition comprising:
- a water-soluble resin;
- a positive-working photosensitizer;
- and
- a solvent,
- wherein the water-soluble resin includes a copolymer including a vinyl alcohol monomer unit and a monomer unit having water solubility.
2 more elements
A method for manufacturing a light-emitting element on a substrate, the method comprising:
- applying the composition including a water-soluble resin, a positive-working photosensitizer and a solvent, the water-soluble resin including a copolymer including a vinyl alcohol monomer unit and a monomer unit having water solubility;
- exposing the applied composition to light;
- cleaning the exposed composition with a developer to develop a pattern of the composition on the substrate;
- forming a light-emitting layer on the substrate on which the pattern is developed;
- and
- peeling and developing, with a solvent, the composition remaining on the substrate on which the light-emitting layer is formed,
- wherein the solvent has a δ (solubility parameter) represented by the following equation (1) of 12.0 or more:
- δ
-
- (
- solubility
-
- parameter
- )
- =
- (
- δ
- d
- 2
- +
- δ
- P
- 2
- +
- δ
- h
- 2
- )
- 1
- /
- 2
- ,
- (
- 1
- )
- where δd is a dispersion term, δP is a polar term, and on is a hydrogen bonding term.
33 more elements
Dependencies are inferred from the claim text.