Display device, method of manufacturing the same, and electronic device including the same

A method of manufacturing a display device, the method comprising:

• providing a transistor array substrate comprising a display area comprising an emission area and a non-emission area and a non-display area outside the display area, the transistor array substrate comprising a pixel circuit in the display area;
• sequentially forming a first conductive layer, a second conductive layer, and a third conductive layer on the transistor array substrate;
• partially etching the third conductive layer to form an opening corresponding to the emission area;
• forming a first layer corresponding to the emission area, a second layer on the first layer, and a third layer covering an upper surface of an edge portion of the second layer by partially etching each of the first conductive layer and the second conductive layer, wherein the third layer defines an opening in the emission area that exposes an upper surface of a central portion of the second layer;
• forming a fourth layer on the second and third layers to form a pixel electrode comprising the first to fourth layers;
• forming an emission layer on the pixel electrode;
• and
• forming a common electrode on the emission layer.

An electronic device comprising:

• a display device configured to display an image;
• and
• a processor configured to provide input image data and an input control signal to the display device,
• wherein the display device comprises:
• a transistor array substrate comprising a display area and a non-display area outside the display area, wherein the display area comprises an emission area and a non-emission area, and the transistor array substrate comprises a pixel circuit in the display area;
• a pixel electrode in the emission area on the transistor array substrate, wherein the pixel electrode comprises:
• a first layer connected to the pixel circuit and comprising a first conductive material;
• a second layer on the first layer and comprising a second conductive material;
• a third layer on the second layer, wherein the third layer comprises a third conductive material, wherein the third layer is on an upper surface of an edge portion of the second layer, and wherein an opening that exposes an upper surface of a central portion of the second layer is defined in the third layer;
• and
• a fourth layer on the second layer and the third layer and comprising a fourth conductive material;
• an emission layer on the pixel electrode;
• and
• a common electrode on the emission layer.