Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorHiroyuki MATSUURA
Life of this patent
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Abstract
A plasma processing apparatus includes: a processing container; a substrate holder inserted into the processing container and configured to hold a plurality of substrates in multiple tiers; a rotation shaft configured to rotate the substrate holder inside the processing container; a gas supply pipe configured to supply a processing gas into the processing container; an exhauster configured to evacuate an interior of the processing container; a pair of flat plate electrodes arranged outside the processing container to face each other across a center of the processing container; and a radio-frequency power supply configured to apply radio-frequency power to the pair of electrodes, thereby generating capacitively-coupled plasma inside the processing container.
Claims8
A plasma processing apparatus comprising:
- a processing container;
- a substrate holder inserted into the processing container and configured to hold a plurality of substrates in multiple tiers;
- a rotation shaft configured to rotate the substrate holder inside the processing container;
- a gas supply pipe configured to supply a processing gas into the processing container;
- an exhauster configured to evacuate an interior of the processing container;
- a pair of flat plate electrodes arranged outside the processing container to face each other across a center of the processing container;
- and
- a radio-frequency power supply configured to apply radio-frequency power to the pair of electrodes, thereby generating capacitively-coupled plasma inside the processing container.
A plasma processing apparatus comprising:
- a processing container;
- a substrate holder configured to be inserted into the processing container and to hold a plurality of substrates in multiple tiers;
- a rotation shaft configured to rotate the substrate holder inside the processing container;
- a gas supply pipe configured to supply a processing gas into the processing container;
- an exhauster configured to evacuate an interior of the processing container;
- a pair of flat plate electrodes arranged outside the processing container to face each other across a center of the processing container;
- and
- a radio-frequency power supply configured to apply radio-frequency power to the pair of electrodes, thereby generating capacitively-coupled plasma inside the processing container,
- wherein each of the pair of electrodes extends in a height direction over a range larger than a height range in which the plurality of substrates are held on the substrate holder;
- and
- an angle formed by connecting both horizontal ends of each electrode and a center of the processing container is within a range of 20° to 60°.
Dependencies are inferred from the claim text.