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US 2026/0279737 A1Published application
Plasma treatment vessel and plasma treatment device
AssigneePlasmapp Co., Ltd.
InventorYou Bong LIM
Life of this patent
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Abstract
The present invention provides a plasma treatment vessel and a plasma treatment device. The plasma treatment vessel may comprise: a housing having an interior space for accommodating a workpiece receiving container; a connection electrode disposed at one end of the housing and having a portion exposed to the interior space; and a magnetic field forming unit disposed in the housing and forming a magnetic field in the interior space.
Claims19
-38 (canceled).
39:
- A plasma treatment vessel comprising:
- a connection electrode connected to an external power source;
- and
- an auxiliary electrode on which a magnetic field forming unit is disposed,
- wherein an internal space in which a workpiece is accommodated is formed between the connection electrode and the auxiliary electrode.
2 more elements
40:
- The plasma treatment vessel as claimed in claim 39, wherein:
- the connection electrode and the auxiliary electrode are disposed to be spaced apart from each other, and a side wall made of a non-conductive material connects the connection electrode to the auxiliary electrode so that the auxiliary electrode is formed in an electrically floating state;
- and
- plasma is formed between the connection electrode and the auxiliary electrode so that plasma treatment is performed on the workpiece.
1 more element
41:
- The plasma treatment vessel as claimed in claim 39, wherein:
- the auxiliary electrode is electrically connected to the connection electrode to receive a potential;
- and
- plasma is formed in an area adjacent to the auxiliary electrode so that plasma treatment is performed on the workpiece.
1 more element
42:
- The plasma treatment vessel as claimed in claim 39, wherein an electric field is formed in the internal space by the external power source to which the connection electrode is connected, and a magnetic field is formed in the internal space by the magnetic field forming unit so that plasma is formed in the internal space.
43:
- The plasma treatment vessel as claimed in claim 42, wherein a density of plasma formed in an area adjacent to the magnetic field forming unit is greater than a density of plasma in other areas of the internal space.
44:
- The plasma treatment vessel as claimed in claim 42, wherein, while the plasma rotates due to components of the electric field and the magnetic field that intersect vertically, plasma treatment is performed on the workpiece.
45:
- The plasma treatment vessel as claimed in claim 39, wherein the magnetic field forming unit is disposed symmetrically based on the internal space.
46:
- The plasma treatment vessel as claimed in claim 45, wherein the magnetic field forming unit is provided in a form of a ring surrounding the internal space.
47:
- The plasma treatment vessel as claimed in claim 45, wherein the magnetic field forming unit is provided as a plurality of the magnetic field forming units that are disposed to be spaced apart from and face each other.
48:
- The plasma treatment vessel as claimed in claim 39, wherein the workpiece is seated on one side of the internal space.
49:
- The plasma treatment vessel as claimed in claim 39, wherein the workpiece is disposed in the internal space while accommodated in a workpiece receiving container.
50:
- The plasma treatment vessel as claimed in claim 49, wherein the magnetic field forming unit is disposed adjacent to the workpiece accommodated in the workpiece receiving container.
51:
- The plasma treatment vessel as claimed in claim 49, wherein the workpiece is accommodated in the workpiece receiving container having one open area and exposed to plasma formed in the internal space.
52:
- The plasma treatment vessel as claimed in claim 39, wherein the workpiece is disposed in an area in which plasma is generated by the connection electrode and the auxiliary electrode in the internal space.
53:
- The plasma treatment vessel as claimed in claim 39, wherein the connection electrode includes a protrusion which protrudes toward the internal space and on which the workpiece receiving container is seated.
54:
- The plasma treatment vessel as claimed in claim 39, wherein:
- the connection electrode and the auxiliary electrode are disposed to be spaced apart from each other;
- and
- at least a portion of a side wall connecting the connection electrode to the auxiliary electrode is made of a transparent material so that plasma treatment is observed from the outside.
1 more element
55:
- A plasma treatment device comprising:
- a sealing part of which an interior accommodates the plasma treatment vessel as claimed in claim 1 and the interior is sealed from an external environment;
- an exhaust part configured to exhaust an atmosphere inside the sealing part and form a low-pressure atmosphere within a preset process pressure range inside the sealing part;
- and
- a treatment part configured to form an electric field inside the sealing part and discharge the low-pressure atmosphere.
2 more elements
56:
- A plasma treatment device comprising:
- a sealing part of which an interior accommodates a workpiece receiving container and the interior is sealed from an external environment;
- an exhaust part configured to exhaust an atmosphere inside the sealing part and form a low-pressure atmosphere within a preset process pressure range inside the sealing part;
- a treatment part configured to form an electric field inside the sealing part and discharge the low-pressure atmosphere;
- and
- a magnetic field forming unit configured to form a magnetic field in the interior of the sealing part.
3 more elements