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US 2026/0277105 A1Published application
Resist underlayer film-forming composition
AssigneeNissan Chemical Corporation
InventorsShou SHIMIZU, Yuki KATO, Kosuke IGATA
Life of this patent
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Abstract
A resist underlayer film-forming composition, containing: a compound (A) including a side chain or a terminal having a chain α,β-unsaturated carbonyl group; and a solvent (B).
Claims14
A resist underlayer film-forming composition, comprising:
- a compound (A) including a side chain or a terminal having a chain α,β-unsaturated carbonyl group;
- and a solvent (B).
Dependencies are inferred from the claim text.