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US 2026/0277101 A1Published application
Resist composition, laminate, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsSatoshi KUSAMA, Kousuke OHYAMA, Shun KIKUCHI, Ryo NISHIKAWA, Masaki OHASHI
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Abstract
The present invention is a resist composition containing a hypervalent iodine compound represented by the following general formula (1) and a solvent. This can provide: a resist composition that can achieve high sensitivity and high resolution in a patterning process; a laminate including a resist film obtained from the resist composition; and a patterning process using the resist composition.
Claims9
A resist composition comprising a hypervalent iodine compound represented by the following general formula (1) and a solvent,
- wherein “m” represents an integer of 0 to 2, “n” represents an integer of 1 to 40, and “k” represents an integer of 0 to 2m+4, the “m's” and the “k's” being identical to or different from each other;
- each R11 represents a carbonyl group or a hydrocarbylene group having 1 to 40 carbon atoms and optionally containing a heteroatom, the R11's being identical to or different from each other;
- each R12 represents a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms and optionally containing a heteroatom, the R12's being identical to or different from each other;
- and
- each R13 represents a halogen atom or a hydrocarbyl group having 1 to 40 carbon atoms and optionally containing a heteroatom, the R13's being identical to or different from each other.
2 more elements
Dependencies are inferred from the claim text.