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US 2026/0277032 A1Published application
Method of forming electro-optical device
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShuen-Shin Liang, Tsung-Fu Tsai, Szu-Wei Lu, Chung-Shi Liu, Chen-Hua Yu
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Abstract
A method includes the following steps. A waveguide is formed. A first electrode and a second electrode are formed at first and second lateral sides of the waveguide. The first electrode and the second electrode surround the first and second lateral sides of the waveguide. A first via is formed on the first electrode.
Claims20
A method, comprising:
- forming a waveguide;
- forming a first electrode and a second electrode at first and second lateral sides of the waveguide, to surround the first and second lateral sides of the waveguide;
- and
- forming a first via on the first electrode.
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A method, comprising:
- forming a waveguide;
- forming a first electrode on a first end portion of the waveguide, to embed the first end portion of the waveguide;
- and
- forming a first via on the first electrode to distance from the first end portion of the waveguide.
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A method, comprising:
- forming a waveguide;
- forming a first electrode and a second electrode on opposite sides of the waveguide along a first direction;
- and
- forming a first conductive via and a second conductive via on the first electrode and the second electrode respectively, wherein a smallest distance between the first conductive via and the second conductive via is larger than a total width of the waveguide along the first direction.
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Dependencies are inferred from the claim text.