Methods of forming cover lens structures for display devices, and related apparatus and devices

A non-transitory computer readable medium comprising instructions that, when executed by a processor, cause the following operations to be conducted:

• depositing a layer on a substrate structure using a dry deposition process that includes plasma enhanced chemical vapor deposition (PECVD), the dry deposition process comprising:
• an oxidizer-to-organosilane gas ratio within a range of 5.0 to 100.0, and
• a first radio-frequency (RF) power density within a range of 0.07 W/cm210to 0.6 W/cm2
• wherein the instructions cause the layer to be deposited at a process temperature that is less than 80 degrees Celsius;
• and
• conducting a plasma treatment operation on the substrate structure, the plasma treatment operation comprising:
• applying a second RF power density that is less than the first RF power density.

A cover lens structure for display devices, comprising:

• a carrier substrate formed of glass;
• a substrate structure mounted to the carrier substrate, the substrate structure comprising a substrate and one or more wet hardcoat layers;
• one or more adhesion promotion layers formed above at least one of the one or more wet hardcoat layers;
• a dry hardcoat layer formed above the one or more adhesion promotion layers;
• and
• an anti-smudge layer formed above the dry hardcoat layer,
• wherein the substrate is formed of one or more polymeric materials.