Bushing diagnostic system

A bushing diagnostic system, comprising:

• a source chamber configured to receive a process gas to generate ions, and to discharge the generated ions through an outlet of the source chamber;
• a power supply for providing a voltage to the source chamber;
• an extraction chamber surrounding the outlet of the source chamber;
• a first flange connected to the source chamber;
• a second flange connected to the extraction chamber;
• a bushing positioned between the first flange and the second flange, the bushing surrounding the source chamber and formed of an insulating material;
• a ground line connected to the second flange;
• a sensor installed on the ground line and configured to measure a current flowing from the bushing and through the ground line;
• a diagnostic device in communication with the sensor and configured to convert a current measured by the sensor into time series data of a charge amount, the diagnostic device configured to analyze the time series data of the charge amount, and determine whether the bushing is abnormal based on the analysis.

A bushing diagnostic system, comprising:

• an ion generating apparatus including:
• a source chamber configured to generate ions and discharge the ions through an outlet of the source chamber;
• a power supply configured to provide a voltage to the source chamber;
• an extraction chamber surrounding the outlet of the source chamber;
• a bushing surrounding the source chamber and positioned adjacent to the extraction chamber, the bushing formed of an insulating material;
• a ground line electrically connected to the bushing;
• and a sensor installed on the ground line and configured to measure a current flowing from the bushing and through the ground line;
• a process chamber in which a wafer is positioned, wherein the ions discharged from the ion generating apparatus are configured to be injected into the wafer;
• a beam line installed between the ion generating apparatus and the process chamber, wherein the beam line is configured to receive the ions from the ion generating apparatus, adjust the ions, and provide the adjusted ions to the process chamber;
• and
• a diagnostic device configured to analyze a partial discharge type of the bushing based on a current measured by the sensor, the diagnostic device configured to determine whether the bushing is abnormal based on the analyzed partial discharge type being classified as a surface discharge.