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US 2026/0276440 A1Published application
Metrology structures with a diffraction grating
AssigneeGlobalFoundries U.S. Inc.
InventorAneesh Dash
Life of this patent
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Abstract
Metrology structures and methods of forming metrology structures. The metrology structure comprises a target layer, a waveguide core including a diffraction grating, and a reflector. The target layer may include a portion that is arranged between the diffraction grating and the reflector or, alternatively, the reflector may be arranged between the diffraction grating and the portion of the target layer.
Claims20
A metrology structure comprising:
- a target layer;
- a first waveguide core including a first diffraction grating;
- and
- a first reflector,
- wherein the target layer includes a first portion that is arranged between the first diffraction grating and the first reflector or the first reflector is arranged between the first diffraction grating and the first portion of the target layer.
2 more elements
A method of forming a metrology structure, the method comprising:
- forming a waveguide core including a diffraction grating;
- forming a target layer;
- and
- forming a reflector,
- wherein the target layer includes a portion that is arranged between the diffraction grating and the reflector or the reflector is arranged between the diffraction grating and the portion of the target layer.
2 more elements
Dependencies are inferred from the claim text.