Silicon single crystal production method and silicon single crystal production apparatus
AssigneeSumco Corporation
InventorsHideki SAKAMOTO, Wataru SUGIMURA, Ryusuke YOKOYAMA, Naoki MATSUSHIMA, Takuya YOTSUI
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AssigneeSumco Corporation
InventorsHideki SAKAMOTO, Wataru SUGIMURA, Ryusuke YOKOYAMA, Naoki MATSUSHIMA, Takuya YOTSUI
Estimating the term…
A production method of monocrystalline silicon of pulling up the monocrystalline silicon while applying a horizontal magnetic field to a silicon melt, by using a monocrystalline silicon production apparatus that includes a crucible and a heater having a hollow cylindrical shape and surrounding the crucible. The heater includes first and second heat generating sections having a hollow semi-cylindrical shape and the same heat generation property. The heater is disposed so that, when the heat generating sections generate heat with mutually different heat generation amounts, heating amounts of first and second portions of the crucible are mutually different. The first and second portions are located on both sides across a vertical virtual plane including a center axis of the crucible and a central magnetic field line of the horizontal magnetic field. The method includes performing first heating and producing while the heat generating sections generate heat with the same heat generation amount, and second heating and producing while the heat generating sections generate heat with mutually different heat generation amounts.
A production method of monocrystalline silicon of pulling up the monocrystalline silicon while applying a horizontal magnetic field to a silicon melt, by using a monocrystalline silicon production apparatus,
A monocrystalline silicon production apparatus configured to pull up a monocrystalline silicon while applying a horizontal magnetic field to a silicon melt, the apparatus comprising:
Dependencies are inferred from the claim text.