Method of producing polishing composition
AssigneeFujimi Incorporated
InventorsTomoaki KAWANO, Kohsuke TSUCHIYA
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Abstract
Provided is a method of producing a polishing composition, the method allowing easy checking of a level of dissolution of a chelating agent during a production process. Provided is a method of producing a polishing composition for polishing a surface formed of a silicon material. The method of producing a polishing composition includes preparing a basic chelating agent-containing liquid containing a basic compound, water, and a chelating agent; and mixing a silica dispersion containing silica particles and water, and the chelating agent-containing liquid.
Claims10
A production method of a polishing composition for polishing a surface formed of a silicon material, the method comprising:
- preparing a basic chelating agent-containing liquid comprising a basic compound, water, and a chelating agent;
- and
- mixing a silica dispersion comprising silica particles and water, and the chelating agent-containing liquid.
Dependencies are inferred from the claim text.