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US 2026/0274873 A1Published application
Silicon precursor compound, composition for forming silicon-containing film including the same, and method of forming silicon-containing film
AssigneeUp Chemical Co., Ltd.
InventorsJin Sik KIM, Byung Kwan KIM, Jun Hwan CHOI, Da Som YU
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Abstract
The present disclosure relates to a silicon precursor compound, a method of preparing the silicon precursor compound, a silicon-containing film-forming precursor composition including the silicon precursor compound, and a method of forming a silicon-containing film using the precursor compound.
Claims10
A method of forming a silicon-containing film, comprising:
- forming a silicon-containing film using a film-forming precursor composition including a silicon precursor compound represented by the following Chemical Formula 2,
- wherein the silicon-containing film is a silicon oxide film:
- wherein, in the above Chemical Formula 2,
- each of R1 and R2 independently includes a linear or branched C1-C4 alkyl group;
- and
- each of R3, R4 and R5 independently includes hydrogen, a linear or branched C1-C4 alkyl group or a linear or branched alkenyl group,
- provided that R3, R4 and R5 are not hydrogen at the same time.
4 more elements
Dependencies are inferred from the claim text.