Low-stress optical surfacing on reaction bonded silicon carbide
AssigneeII-Vi Delaware, Inc.
InventorsKyle Branigan, Stanley Himelinski, Domenic Michaux
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Abstract
Systems and methods are provided for low-stress optical surfacing on reaction bonded silicon carbide. A reaction bonded silicon carbide (RB-SiC) based structure may include a substrate, a physical vapor deposition (PVD) or other suitable vacuum deposition (VD) based optical layer on top of the substrate, and optionally one or more PVD (or other suitable vacuum deposition (VD) technique) based tacking layers disposed immediately on the surface of the substrate.
Claims19
A reaction bonded silicon carbide (RB-SiC) composite structure with low-stress optical surfacing, the reaction bonded silicon carbide (RB-SiC) composite structure comprising:
- a substrate that comprises a silicon carbide (SiC) based composite;
- and
- an optical layer on top of the substrate;
- wherein the optical layer is formed on top of the substrate using a vacuum deposition (VD) technique;
- and
- wherein the optical layer has a final optical surface that is smooth and flat.
A method comprising:
- forming a reaction bonded silicon carbide (RB-SiC) composite structure with low-stress optical surfacing, wherein the forming comprises:
- forming a substrate using a silicon carbide (SiC) based composite;
- an optical layer on top of the substrate, wherein the optical layer is formed on top of the substrate using a vacuum deposition (VD) technique;
- and
- processing the RB-SiC composite structure such that the optical layer has a final optical surface that is smooth and flat.
Dependencies are inferred from the claim text.