Methods for fabrication of mems devices
AssigneeOmnitron Sensors Inc.
InventorTrent Huang
Life of this patent
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Abstract
A method for fabricating a micro-electromechanical system (MEMS) mirror device is disclosed. The mirror device has an in plane actuator directly under the mirror. A device layer, a handle layer, and a buried oxide layer between the handle layer and the device layer is provided. A top trench is created in a top surface of the device layer. An oxide layer is created over the top surface of the device layer and the top trench. The top of the device layer and the top trench is coated with a first polysilicon layer. The oxide layer of the top trench or the top of the device layer is etched away to create an isolated structure from the first polysilicon layer. Areas of the handle layer and the buried oxide layer are etched away to create a support structure attached to the isolated structure.
Claims20
A method of fabricating a micro-electromechanical systems (MEMS) device, comprising:
- providing a device layer, a handle layer, and a buried oxide layer between the handle layer and the device layer;
- creating a top trench in a top surface of the device layer;
- creating an oxide layer over the top surface of the device layer and the top trench;
- coating the top of the device layer and the top trench with a first polysilicon layer;
- etching away the oxide layer of the top trench or the top of the device layer to create an isolated structure from the first polysilicon layer;
- and
- etching away areas of the handle layer and the buried oxide layer to create a support structure attached to the isolated structure.
A method of fabricating a micro-electromechanical systems (MEMS) mirror comprising:
- etching an isolation trench in a device layer formed on a buried oxide layer, and a handle layer;
- etching a plurality of finger defining trenches in the device layer, wherein the plurality of finger defining trenches are parallel to the isolation trench;
- growing an oxide layer to fill the isolation trench and coat sides of the finger defining trenches;
- growing a polysilicon layer to fill the finger defining trenches;
- removing the oxide layer coating sides of the finger defining trenches and the isolation trench to create a plurality of polysilicon fingers separated by a gap from a plurality of fingers of the device layer;
- etching away areas of the handle layer and the buried oxide layer to define a support structure under the finger defining trenches;
- etching away the oxide layer over the isolation trench to release the support structure and the finger defining trenches;
- and
- metalizing a surface of the support structure to form a mirror surface.
A micro-electromechanical system (MEMS) device comprising:
- an electrostatic actuator having a stator and a rotor;
- a moveable structure having a bottom area coupled to the rotor, wherein the actuator is positioned under the moveable structure;
- a base supporting the stator;
- and
- a hinge coupled between the base and the moveable structure, wherein the actuator moves the moveable structure on the hinge.
Dependencies are inferred from the claim text.